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dc.contributor.authorVlasov, Viktor Alekseevichen
dc.contributor.authorPushkarev, A. I.en
dc.contributor.authorRemnev, Gennady Efimovichen
dc.contributor.authorSazonov, R. V.en
dc.contributor.authorSosnovskiy, S. A.en
dc.date.accessioned2015-11-20T02:45:22Z-
dc.date.available2015-11-20T02:45:22Z-
dc.date.issued2007-
dc.identifier.citationNonequilibrium plasmachemical processes - the basis of future plasma technologies / V. A. Vlasov [et al.] // Bulletin of the Tomsk Polytechnic University. — 2007. — Vol. 311, № 2. — [P. 69-73].ru
dc.identifier.issn1684-8519-
dc.identifier.urihttp://earchive.tpu.ru/handle/11683/1294-
dc.description.abstractLaws of molecule excitation in basic electronic condition have been considered. It was shown that nonequilibrium excitation of oscillatory degrees of molecule freedom was the most effective for initiation of chemical reactions. Plasmachemical processes proceeding in such conditions have a number of advantages allowing at their use in traditional manufactures decreasing power inputs and increasing productivity. Conditions realized at pulse excitation of gas mixes are also favorable for organizing chain chemical processes. Experimental data of chain chemical process realization in plasma of pulse electronic beam were presented. Other perspective plasma technologies - pulse radiolysis of liquid phase hydrocarbons at low temperature in conditions of electronic beam influence with high current density,initiation of carbon-black formation process in nonequilibrium conditions were also considereden
dc.format.mimetypeapplication/pdf-
dc.language.isoenen
dc.publisherТомский политехнический университетru
dc.relation.ispartofBulletin of the Tomsk Polytechnic University. 2007. Vol. 311, № 2-
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.sourceBulletin of the Tomsk Polytechnic University-
dc.subjectnonequilibrium plasmachemical processes-
dc.subjectplasma technologies-
dc.subjectmolecules-
dc.subjectelectronic conditions-
dc.subjectchemical reactions-
dc.subjecttraditional manufactures-
dc.subjectpower inputs-
dc.subjectproductivity-
dc.subjectpulse excitation-
dc.subjectgas mixes-
dc.subjectchain chemical processes-
dc.subjectexperimental data-
dc.subjectplasma-
dc.subjectpulse electronic beams-
dc.subjectpulse radiolysis-
dc.subjectliquid phase hydrocarbons-
dc.subjectlow temperature-
dc.subjecthigh density-
dc.subjectcurrent-
dc.subjectcarbon-black formation-
dc.subjectnonequilibrium conditions-
dc.titleNonequilibrium plasmachemical processes - the basis of future plasma technologiesru
dc.typeArticleen
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.typeinfo:eu-repo/semantics/articleen
dcterms.audienceResearchesen
local.description.firstpage69-
local.description.lastpage73-
local.filepathhttp://www.lib.tpu.ru/fulltext/v/Bulletin_TPU/2007/v311eng/i2/19.pdf-
local.identifier.bibrecRU\TPU\book\197958-
local.identifier.perskeyRU\TPU\pers\26492-
local.identifier.perskeyRU\TPU\pers\31500-
local.issue2-
local.localtypeСтатьяru
local.volume311-
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