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dc.contributor.authorUmnov, Sergey Pavlovichru
dc.contributor.authorAsainov, Oleg Khaydarovichru
dc.date.accessioned2016-03-16T09:25:59Z-
dc.date.available2016-03-16T09:25:59Z-
dc.date.issued2015-
dc.identifier.citationUmnov S. P. Change Spectrum Characteristics Modification of Films Deposited by Magnetron Sputtering with the Assistance of Argon Ions Beam / S. P. Umnov, O. Kh. Asainov // IOP Conference Series: Materials Science and Engineering. — United Kingdom : IOP Publishing. — Vol. 81 : Radiation-Thermal Effects and Processes in Inorganic Materials : International Scientific Conference, 3-8 November 2014, Tomsk, Russia : [proceedings]. — [012001, 5 p.].ru
dc.identifier.urihttp://earchive.tpu.ru/handle/11683/14685-
dc.description.abstractThin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic-force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.ru
dc.language.isoenen
dc.publisherIOP Publishingru
dc.relation.ispartofIOP Conference Series: Materials Science and Engineering. Vol. 81 : Radiation-Thermal Effects and Processes in Inorganic Materials. — United Kingdom, 2015.ru
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.subjectспектрыru
dc.subjectпленкиru
dc.subjectмагнетронное распылениеru
dc.subjectионы аргонаru
dc.subjectпросвечивающая электронная микроскопияru
dc.subjectрентгеновская дифрактометрияru
dc.titleChange Spectrum Characteristics Modification of Films Deposited by Magnetron Sputtering with the Assistance of Argon Ions Beamru
dc.typeConference Paperen
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.typeinfo:eu-repo/semantics/conferencePaperen
dcterms.audienceResearchesen
local.departmentНациональный исследовательский Томский политехнический университет (ТПУ)::Физико-технический институт (ФТИ)::Кафедра технической физики (№ 23) (ТФ)::Лаборатория № 16ru
local.description.firstpage120015-
local.filepathhttp://dx.doi.org/10.1088/1757-899X/81/1/012001-
local.identifier.bibrecRU\TPU\network\7923-
local.identifier.colkeyRU\TPU\col\19671-
local.identifier.perskeyRU\TPU\pers\34215-
local.identifier.perskeyRU\TPU\pers\34632-
local.localtypeДокладru
local.volume81-
local.conference.nameRadiation-Thermal Effects and Processes in Inorganic Materials-
local.conference.date2014-
dc.identifier.doi10.1088/1757-899X/81/1/012001-
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