Low-energy plasma-immersion implantation of nitrogen ions in titanium by a beam with ballistic focusing

Abstract

The results of experiments on low-energy implantation of nitrogen ions into VT1-0 titanium alloy are presented. Processing was performed by a nitrogen ion pulsed beam obtained using a ballistic ion focusing system. An ion source was a nitrogen plasma of the non-self-sustained gas arc discharge with a thermionic cathode. It has been shown that when the specimens are processed in such a system, hardness of the surface increases from 1.5 to 2.5 times. In addition, the surface of the specimens undergoes ion etching which causes the formation of an etching cavity whose profile depends on the ion effect parameters.