Моделирование процесса магнетронного осаждения хрома при планетарном вращении подложки

Abstract

The present work investigates the method of simulating magnetron sputtering processes in the case of deposition of chromium coatings. The change in the angle and the distance between the substrate and magnetron target has its impact on the deposition rate and the energy transfer from deposition flux onto the surface of the substrate. This may result in differences in chromium coatings structure. The model was created to simulate the rotational motion of the substrate inside a magnetron sputtering system. The relations between deposition rate and various geometry of the system were found. The experimental verification is to be carried out