Подбор режимов работы радиочастотного источника оптически-эмиссионного спектрометра тлеющего разряда GD-Profiler 2 для анализа тонких пленок

Abstract

Modern technologies cannot do without materials with special characteristics, some of these materials are coatings and thin films. Coatings and thin films are used in various areas ranging from optics to protective films from any effects. The characteristics of these films mainly depend on two factors of composition and structure. These factors must be carefully controlled, but one method of controlling the elemental composition is glow discharge spectrometry. This study aims to study the sputtering modes for a pulsed radio frequency source of a glow discharge spectrometer DG-Profiler 2.