Please use this identifier to cite or link to this item: http://earchive.tpu.ru/handle/11683/57749
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dc.contributor.authorRyabchikov, Aleksandr Ilyichen
dc.contributor.authorSivin, Denis Olegovichen
dc.contributor.authorShevelev, Aleksey Eduardovichen
dc.contributor.authorModebadze, Georgy Slavovichen
dc.date.accessioned2020-01-31T09:23:58Z-
dc.date.available2020-01-31T09:23:58Z-
dc.date.issued2019-
dc.identifier.citationPeculiarities of the formation of high-intensity ion beams of gases, metals and semiconductor materials / A. I. Ryabchikov [et al.] // Gas Discharge Plasmas and Their Applications (GDP 2019) : 14th International Conference, September 15–21, 2019, Tomsk, Russia : abstracts. — Tomsk : TPU Publishing House, 2019. — [С. 215].en
dc.identifier.urihttp://earchive.tpu.ru/handle/11683/57749-
dc.language.isoenen
dc.relation.ispartofGas Discharge Plasmas and Their Applications (GDP 2019) : 14th International Conference, September 15–21, 2019, Tomsk, Russia. — Tomsk, 2019.ru
dc.rightsinfo:eu-repo/semantics/openAccessen
dc.subjectвысокоинтенсивные пучкиru
dc.subjectионные пучкиru
dc.subjectгазыru
dc.subjectметаллыru
dc.subjectполупроводниковые материалыru
dc.subjectплазменно-иммерсионное формированиеru
dc.subjectинжекцияru
dc.subjectплазмаru
dc.subjectдрейфru
dc.titlePeculiarities of the formation of high-intensity ion beams of gases, metals and semiconductor materialsen
dc.typeConference Paperen
dc.typeinfo:eu-repo/semantics/publishedVersionen
dc.typeinfo:eu-repo/semantics/conferencePaperen
dcterms.audienceResearchesen
local.description.firstpage215-
local.filepathconference_tpu-2019-C108_p215.pdf-
local.identifier.bibrecRU\TPU\conf\32444-
local.identifier.perskeyRU\TPU\pers\30912-
local.identifier.perskeyRU\TPU\pers\34240-
local.identifier.perskeyRU\TPU\pers\36832-
local.identifier.perskeyRU\TPU\pers\44999-
local.localtypeДокладru
local.conference.nameGas Discharge Plasmas and Their Applications (GDP 2019)-
local.conference.date2019-
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