Please use this identifier to cite or link to this item:
http://earchive.tpu.ru/handle/11683/57749
Title: | Peculiarities of the formation of high-intensity ion beams of gases, metals and semiconductor materials |
Authors: | Ryabchikov, Aleksandr Ilyich Sivin, Denis Olegovich Shevelev, Aleksey Eduardovich Modebadze, Georgy Slavovich |
Keywords: | высокоинтенсивные пучки; ионные пучки; газы; металлы; полупроводниковые материалы; плазменно-иммерсионное формирование; инжекция; плазма; дрейф |
Issue Date: | 2019 |
Citation: | Peculiarities of the formation of high-intensity ion beams of gases, metals and semiconductor materials / A. I. Ryabchikov [et al.] // Gas Discharge Plasmas and Their Applications (GDP 2019) : 14th International Conference, September 15–21, 2019, Tomsk, Russia : abstracts. — Tomsk : TPU Publishing House, 2019. — [С. 215]. |
URI: | http://earchive.tpu.ru/handle/11683/57749 |
Appears in Collections: | Материалы конференций |
Files in This Item:
File | Description | Size | Format | |
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conference_tpu-2019-C108_p215.pdf | 359,56 kB | Adobe PDF | View/Open |
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