Please use this identifier to cite or link to this item: http://earchive.tpu.ru/handle/11683/57749
Title: Peculiarities of the formation of high-intensity ion beams of gases, metals and semiconductor materials
Authors: Ryabchikov, Aleksandr Ilyich
Sivin, Denis Olegovich
Shevelev, Aleksey Eduardovich
Modebadze, Georgy Slavovich
Keywords: высокоинтенсивные пучки; ионные пучки; газы; металлы; полупроводниковые материалы; плазменно-иммерсионное формирование; инжекция; плазма; дрейф
Issue Date: 2019
Citation: Peculiarities of the formation of high-intensity ion beams of gases, metals and semiconductor materials / A. I. Ryabchikov [et al.] // Gas Discharge Plasmas and Their Applications (GDP 2019) : 14th International Conference, September 15–21, 2019, Tomsk, Russia : abstracts. — Tomsk : TPU Publishing House, 2019. — [С. 215].
URI: http://earchive.tpu.ru/handle/11683/57749
Appears in Collections:Материалы конференций

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