Please use this identifier to cite or link to this item: http://earchive.tpu.ru/handle/11683/57828
Title: Deposition of cubic tungsten carbide coating on metal substrates at sputtering of electric discharge plasma
Authors: Sivkov, Aleksandr Anatolyevich
Shanenkov, Ivan Igorevich
Ivashutenko, Alexander Sergeevich
Nikitin, Dmitry Sergeevich
Shanenkova, Yuliya Leonidovna
Rakhmatullin, Ilyas Aminovich
Keywords: осаждение; кубический карбид вольфрама; распыление; электроразрядная плазма
Issue Date: 2019
Publisher: IOP Publishing
Citation: Deposition of cubic tungsten carbide coating on metal substrates at sputtering of electric discharge plasma / A. A. Sivkov [et al.] // Journal of Physics: Conference Series. — 2019. — Vol. 1393 : Gas Discharge Plasmas and Their Applications (GDP 2019) : 14th International Conference, 15–21 September 2019, Tomsk, Russia : [proceedings]. — [012133, 6 p.].
Abstract: Hexagonal modifications of tungsten carbide are widely used in various metalworking products and tools. However, the cubic tungsten carbide phase is still poorly understood due to significant difficulties in its synthesis, both in the form of powdered products, and in bulk form. This leads to the impossibility of conducting direct studies of its physical and mechanical properties. This paper shows the opportunity to obtain bulk coatings with a thickness of up to 70 µm, mainly consisting of cubic tungsten carbide using the plasma-dynamic method. The coating formation occurs when spraying the electric discharge tungsten-carbon containing plasma on a metal substrate made of a titanium and aluminum alloy due to the high rate of sputtering and crystallization. This allows synthesizing a stable coating adherent to the substrate based on cubic tungsten carbide with a purity of its yield of at least 85 wt.%.
URI: http://earchive.tpu.ru/handle/11683/57828
Appears in Collections:Материалы конференций

Files in This Item:
File SizeFormat 
conf-nw-32421.pdf1,66 MBAdobe PDFView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.