Please use this identifier to cite or link to this item: http://earchive.tpu.ru/handle/11683/132814
Title: Влияние распределения валентной электронной плотности в плёнке Cr/Zr на характер связи водород-металл
Other Titles: Influence of valence electron density distribution in Cr/Zr thin film on hydrogen-metal bonding
Authors: Врублевский, Д. Б.
metadata.dc.contributor.advisor: Святкин, Леонид Александрович
Keywords: zirconium; chromium; hydrogen; first-principal calculation; Bader charge analysis
Issue Date: 2025
Publisher: Томский политехнический университет
Citation: Врублевский, Д. Б. Влияние распределения валентной электронной плотности в плёнке Cr/Zr на характер связи водород-металл / Д. Б. Врублевский ; науч. рук. Л. А. Святкин // Перспективы развития фундаментальных наук. — Томск : Изд-во ТПУ, 2025. — Т. 1 : Физика. — С. 65-67.
Abstract: We performed an ab initio study of the interaction of hydrogen atoms with the Cr surface and the Cr/Zr interface. The valence electron density distribution was obtained by the pseudopotential method performed in ABINIT package. The presence of negatively charged Cr atomic layers on Cr surface and at Cr/Zr interface, as well as positively charged Zr atomic layers at Cr/Zr interface, was shown based on the results of Bader charge analysis; the presence of the electrical dipole moment is also noticed. It is found, that the hydrogen-metal bonds at Cr/Zr interface a have high degree of bond iconicity and the hydrogen-metal bonds on Cr surface have a high degree of bond covalency
URI: http://earchive.tpu.ru/handle/11683/132814
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