Please use this identifier to cite or link to this item:
http://earchive.tpu.ru/handle/11683/34846| Title: | Deposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate |
| Authors: | Zhidik, Y. S. Troyan, P. E. Baturina, E. V. Korzhenko, Dmitry Vladimirovich Yuriev, Yuri Nikolaevich |
| Keywords: | сопротивление; пленки; реактивное распыление; магнетронное распыление; мишени; подложки; осаждение; полупроводниковые приборы; оптоэлектроника |
| Issue Date: | 2016 |
| Publisher: | IOP Publishing |
| Citation: | Deposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate / Y. S. Zhidik [et al.] // IOP Conference Series: Materials Science and Engineering. — 2016. — Vol. 135 : Issues of Physics and Technology in Science, Industry and Medicine : VIII International Scientific Conference, 1–3 June 2016, Tomsk, Russia : [proceedings]. — [012055, 5 p.]. |
| Abstract: | Detailed information on the deposition technology of the low-resistive ITO-films in oxygen-containing media by magnetron reactive sputtering from the In(90%)/Sn(10%) target on the cold substrate is given. Developed technology allows deposition ITO-films with sheet resistance transparency higher than 90%. Developed technology is notable for high reproducibility of results and is compatible with production technology of semiconductor devices of optoelectronics. |
| URI: | http://earchive.tpu.ru/handle/11683/34846 |
| Appears in Collections: | Материалы конференций |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| dx.doi.org-10.1088-1757-899X-135-1-012055.pdf | 831,27 kB | Adobe PDF | View/Open |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.