Моделирование зависимости профилей распределения интенсивностей элементов с учетом неравномерности распыления оптически-эмиссионного спектрометра тлеющего разряда для анализа многослойных покрытий

Abstract

Modern technologies cannot do without materials with special characteristics; some of these materials are coatings and thin films. Coatings and thin films are used in various fields, from optics to protective films from any influences. In addition to the technological problems associated with the deposition of a large number of layers, methodological problems also arise in profiling due to the physical and instrumental artifacts that accompany ion sputtering of ultrathin and thin multilayer coatings. These factors must be carefully monitored, but spectrometry is one of the methods for controlling the elemental composition glow discharge. The purpose of this study is the ability to adjust the distribution profiles of chemical elements after analysis using a glow discharge spectrometer GD-Profiler 2.