Please use this identifier to cite or link to this item:
http://earchive.tpu.ru/handle/11683/57749| Title: | Peculiarities of the formation of high-intensity ion beams of gases, metals and semiconductor materials |
| Authors: | Ryabchikov, Aleksandr Ilyich Sivin, Denis Olegovich Shevelev, Aleksey Eduardovich Modebadze, Georgy Slavovich |
| Keywords: | высокоинтенсивные пучки; ионные пучки; газы; металлы; полупроводниковые материалы; плазменно-иммерсионное формирование; инжекция; плазма; дрейф |
| Issue Date: | 2019 |
| Citation: | Peculiarities of the formation of high-intensity ion beams of gases, metals and semiconductor materials / A. I. Ryabchikov [et al.] // Gas Discharge Plasmas and Their Applications (GDP 2019) : 14th International Conference, September 15–21, 2019, Tomsk, Russia : abstracts. — Tomsk : TPU Publishing House, 2019. — [С. 215]. |
| URI: | http://earchive.tpu.ru/handle/11683/57749 |
| Appears in Collections: | Материалы конференций |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| conference_tpu-2019-C108_p215.pdf | 359,56 kB | Adobe PDF | View/Open |
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