Please use this identifier to cite or link to this item: http://earchive.tpu.ru/handle/11683/35005
Title: Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology
Authors: Okhotnikov, Vitaly Vladimirovich
Linnik, Stepan Andreevich
Gaydaychuk, Alexander Valerievich
Keywords: ионное травление; плазмохимическое травление; алмазные покрытия; поверхности; морфология; алмазные пленки; химическое осаждение; плазма; тлеющие разряды; сканирующая электронная микроскопия; атомно-силовая микроскопия; фазовый состав; микроструктуры
Issue Date: 2016
Publisher: AIP Publishing
Citation: Okhotnikov V. V. Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology / V. V. Okhotnikov, S. A. Linnik, A. V. Gaydaychuk // AIP Conference Proceedings. — 2016. — Vol. 1772 : Prospects of Fundamental Sciences Development (PFSD-2016) : XIII International Conference of Students and Young Scientists, 26–29 April 2016, Tomsk, Russia : [proceedings]. — [040007, 5 p.].
Abstract: The effect of treatment by reactive ion etching in an argon atmosphere, and hydrogen plasma etching in a glow discharge plasma on the surface of the diamond films was investigated. Diamond films were deposited by the Chemical Vapor Deposition method on the hard alloy VK-8 substrates. The crystallites direction under the influence of argon ion beam processing was changed by 45 degrees from the original. The surface morphology becomes more developed (an average value of 20%) by etching in a glow discharge plasma in an atmosphere of hydrogen. Raman spectroscopy, Scanning Electron Microscope and Atomic Force Microscopy were used to determine the phase and microstructure composition of deposited films.
URI: http://earchive.tpu.ru/handle/11683/35005
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