Please use this identifier to cite or link to this item:
http://earchive.tpu.ru/handle/11683/35005
Title: | Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology |
Authors: | Okhotnikov, Vitaly Vladimirovich Linnik, Stepan Andreevich Gaydaychuk, Alexander Valerievich |
Keywords: | ионное травление; плазмохимическое травление; алмазные покрытия; поверхности; морфология; алмазные пленки; химическое осаждение; плазма; тлеющие разряды; сканирующая электронная микроскопия; атомно-силовая микроскопия; фазовый состав; микроструктуры |
Issue Date: | 2016 |
Publisher: | AIP Publishing |
Citation: | Okhotnikov V. V. Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology / V. V. Okhotnikov, S. A. Linnik, A. V. Gaydaychuk // AIP Conference Proceedings. — 2016. — Vol. 1772 : Prospects of Fundamental Sciences Development (PFSD-2016) : XIII International Conference of Students and Young Scientists, 26–29 April 2016, Tomsk, Russia : [proceedings]. — [040007, 5 p.]. |
Abstract: | The effect of treatment by reactive ion etching in an argon atmosphere, and hydrogen plasma etching in a glow discharge plasma on the surface of the diamond films was investigated. Diamond films were deposited by the Chemical Vapor Deposition method on the hard alloy VK-8 substrates. The crystallites direction under the influence of argon ion beam processing was changed by 45 degrees from the original. The surface morphology becomes more developed (an average value of 20%) by etching in a glow discharge plasma in an atmosphere of hydrogen. Raman spectroscopy, Scanning Electron Microscope and Atomic Force Microscopy were used to determine the phase and microstructure composition of deposited films. |
URI: | http://earchive.tpu.ru/handle/11683/35005 |
Appears in Collections: | Материалы конференций |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
dx.doi.org-10.1063-1.4964566.pdf | 657,28 kB | Adobe PDF | View/Open |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.