Влияние напряжения смещения на морфологию поверхности и структуру азотсодержащих тонких пленок диоксида титана

Abstract

Nitrogen-TiO2 thin films have been deposited by the reactive magnetron sputtering by using differentO2/N2 gas ratios and negative bias voltage. This work reports on the study results of the changes in the surfacemorphology, structure and phase composition of the thin films depending on deposition modes. SEM analysisshowed the reduction of grains with nitrogen introduction. XRD data demonstrated phase transition in the filmsthrough the nitrogen incorporation and bias voltage applying.