Please use this identifier to cite or link to this item:
http://earchive.tpu.ru/handle/11683/35867| Title: | Highly selective deposition of CVD diamond on si wafers by using a combined technique of photolithography and ion etching |
| Authors: | Okhotnikov, Vitaly Vladimirovich Linnik, Stepan Andreevich Gaydaychuk, Alexander Valerievich |
| Keywords: | осаждение; алмазы; фотолитография; ионное травление; CVD diamond catings; glow discharge plasma; selective deposition; structure |
| Issue Date: | 2016 |
| Citation: | Okhotnikov V. V. Highly selective deposition of CVD diamond on si wafers by using a combined technique of photolithography and ion etching / V. V. Okhotnikov, S. A. Linnik, A. V. Gaydaychuk // Energy Fluxes and Radiation Effects (EFRE-2016) : International Congress, October 2–7, 2016, Tomsk, Russia : abstracts. — Tomsk : TPU Publishing House, 2016. — [P. 351]. |
| URI: | http://earchive.tpu.ru/handle/11683/35867 |
| Appears in Collections: | Материалы конференций |
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| File | Description | Size | Format | |
|---|---|---|---|---|
| conference_tpu-2016-C117_p352.pdf | 226,89 kB | Adobe PDF | View/Open |
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