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http://earchive.tpu.ru/handle/11683/70753| Title: | Effect of Al Addition on the Oxidation Resistance of HfC Thin Films |
| Authors: | Gaydaychuk, Alexander Valerievich Linnik, Stepan Andreevich Mitulinsky, Aleksandr Sergeevich Zenkin, Sergey Petrovich |
| Keywords: | окисление; магнетронное распыление; Hf–Al–C; oxidation resistanc; magnetron sputtering |
| Issue Date: | 2022 |
| Publisher: | MDPI AG |
| Citation: | Effect of Al Addition on the Oxidation Resistance of HfC Thin Films / A. V. Gaydaychuk, S. A. Linnik, A. S. Mitulinsky, S. P. Zenkin // Coatings. — 2022. — Vol. 12, iss. 1. — [27, 7 p.]. |
| Abstract: | In this paper, we focus on the research of Al addition on Hf–Al–C film structure and oxidation resistance. It was found that obtained Hf–A–C films consist of a solid solution of Al in non-stoichiometric cubic HfC and have identical XRD patterns to bcc–HfC. Besides, the Al addition decreases the sample mass gain during oxidation in air at temperatures up to 800 °C. Mass gain for Hf–Al–C was 44.3 and 22.5% less, compared to pristine HfC, at 600 and 800 °C, respectively. |
| URI: | http://earchive.tpu.ru/handle/11683/70753 |
| Appears in Collections: | Репринты научных публикаций |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| reprint-nw-38399.pdf | 2,74 MB | Adobe PDF | View/Open |
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